Through the innovation of specialty chemicals and materials under our Alpha, Compugraphics, Electrolube, Kester, and MacDermid Enthone brands provide solutions that power electronics interconnection.
Product Description | Product Offered | Product Model |
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Our Immersion Tin Processes represent the pinnacle of trusted reliability for tin metal final finishes in the automotive electronics segment and beyond. |
Organic Metal-Based Immersion Tin Processes |
ORMECON CSN |
It offers a chemically stable, low foaming and efficient application process that delivers excellent Pb-free solderability and an extremely planar surface. MacStan HSR 3.0 is the immersion tin plating process designed specifically to inhibit whisker formation and deliver a tin deposit with an extended shelf life of up to 12 months. | MacStan HSR 3.0 is the immersion tin plating process designed specifically to inhibit whisker formation and deliver a tin deposit with an extended shelf life of up to 12 months. |
MacStan HSR 3.0 |
Copper Adhesion Promotion | PackageBond is the no-risk adhesion promotion system specifically engineered for reliability for today’s intense lead-free circuit assembly temperatures. |
Packagebond HT-U |
Industry standard resist strippers, developers, innerlayer cleaners, and dry film resists. | high-performance Photoresist Strippers. |
RS-999 |
Effective descaling and anti-scumming additives plus the ease of handling a pure liquid concentrate. The Developer 40 contains no suspended particles, reducing clogging and wear of the apparatus compared to solid carbonate. | Highly Concentrated Aqueous Photoresist developer solutions, making feed-and-bleed control of the developer solution simple and consistent. |
Developer 45 Plus |
Liquid, silicone-free anti-foam agent specifically engineered for spray Developer and Resist Strip applications. |
MacDermid AF (Antifoam |
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High speed, moderate capacity, continuous alkaline etchant system used in the manufacture of fine line printed circuit boards. It will remove capper at an etch rate of 2.0 -2.5 mils per mlnute at 125F (52"C), and can dissolve and hokl copper in solution in the range of 12 to 18 oz/gal(90 to 135 gm/L). | Fine Line Alkaline Etch |
Ultra Etch FL |