Semiconductor Equipment

Toyo Adtec Semiconductor Equipment Line

Manual Wafer Mounter | TAM Series

The TAM Series Manual Wafer Mounter delivers highly precise, uniform tape application for semiconductor manufacturing and research environments. Engineered for versatility, the series includes the compact TAM-6800 (supporting 6″ to 8″ wafers) and the high-capacity TAM-1200 (supporting 8″ to 12″ wafers). Both systems feature an integrated vacuum chuck capable of reaching up to 90°C to guarantee bubble-free lamination and optimized tape adhesion across variable wafer thicknesses.

Designed to fit comfortably into cleanroom benches, the TAM Series balances a compact physical footprint with industrial-grade reliability. Operating on standard single-phase AC infrastructure and low pneumatic consumption (10 L/min), these manual mounters provide a stable, cost-effective solution for low-to-medium volume wafer processing without compromising on processing quality.

Key Advantages

  • Flexible Wafer Handling: Seamlessly accommodates wafer sizes from 150mm up to 300mm across a wide variety of industry-standard tape frame formats.
  • Thermal Precision: Features an adjustable vacuum table heating system up to 90°C to eliminate micro-bubbles and improve tape compliance.
  • Efficient Infrastructure: Low-maintenance design utilizing simple pneumatic pressure (4.0–5.0 kgf/cm²+G) and standard AC 110V/220V electricity.
Technical Specification Model: TAM-6800 Model: TAM-1200
Wafer Capability Range 6″ to 8″ (150mm to 200mm) 8″ to 12″ (200mm to 300mm)
Compatible Tape Frame Formats 2-6-1, 2-8-1, 2-10-1 2-8-1, 2-10-1, 2-12-1
Maximum Vacuum Chuck Temperature 90°C 90°C
Electrical Infrastructure Requirements Single Phase AC 110V / 220V Single Phase AC 110V / 220V
Pneumatic Operating Pressure 4.0 - 5.0 kgf/cm² +G 4.0 - 5.0 kgf/cm² +G
Maximum Pneumatic Flow Consumption 10 L/min (ANR) 10 L/min (ANR)
Equipment Footprint (W x D x H) 820 x 610 x 400 mm 1000 x 610 x 500 mm
Net Equipment Weight 30 kg 40 kg

Semi Auto Expander | TAE Series

The TAE Series Semi-Auto Expander provides an exceptionally precise and reliable solution for expanding diced wafers to facilitate seamless die sorting and picking. Built to adapt to diverse cleanroom workflows, the series spans across model tiers designed to accommodate standard wafer sizes from 4″ up to 12″ and matching frame sizes. Utilizing an advanced, human-machine interface (HMI) paired with automated safety overrides, the TAE Series maximizes process consistency while significantly eliminating human error and accidental product damage.

Unlike standard market alternatives that rely on less consistent drive mechanisms, the TAE Series employs a high-precision ball screw paired with a servo motor to drive the platform's ascent and descent. This configuration allows operators to completely customize expansion height and traveling speed, resulting in uniform tape stretching without risking die dislocation.

Key Features & Advantages

  • Servo-Driven Precision Control: Driven by an integrated high-precision screw and servo motor system, ensuring ultra-exact adjustments to the platform’s ascent and descent speeds and height positions.
  • Optical Sensing Fail-Safe: Equipped with advanced optical safety sensors that automatically halt subsequent actions if the grip frame or cover is misaligned, preventing operator injuries and protecting delicate wafers.
  • Integrated Rotary Cutting: Includes a dedicated rotary knife cutting mechanism to ensure clean, precise tape separation following expansion sequences.
  • Scalable Structural Footprint: Seamlessly handles everything from 4″ to 12″ wafer capacities (across T4 through T12 double ring configurations) within a compact, uniform W500 × L700 × H500 mm frame.
Item Models: TAE-T4-6 / T5-6 / T6-6 Models: TAE-T7-8 / T8S-8 Model: TAE-T12-12
Wafer Size Capability 4″ ~ 6″ 4″ ~ 8″ 4″ ~ 12″
Tape Frame Size 6″ 8″ 12″
Compatible Double Ring T4 / T5 / T6 T7 / T8S T12
Dimensions (W x L x H) 500 × 700 × 500 mm
Double Ring Item Inner Ring (I.D. / O.D.) Outer Ring (I.D. / O.D.) Target Wafer Size
T-4 123 / 129 mm 129 / 134 mm 4″
T-5 140 / 146 mm 146 / 152 mm 5″
T-6 170 / 178 mm 178 / 186 mm 6″
T-7 195 / 203 mm 203 / 210 mm 7″
T-8S 225 / 233 mm 233 / 241 mm 8″
T12 325 / 335 mm 335 / 345 mm 12″

TAC Series Wafer Cleaner | CL Series

The TAC Series Wafer Cleaner delivers advanced, high-efficiency cleaning for wafer processing environments where substrate surface purity is critical. Engineered to remove microscopic contaminants and residual debris following dicing or grinding, this system ensures pristine wafer surfaces to safeguard subsequent downstream processes. Available in various models to match precise manufacturing lines, the series seamlessly accommodates standard wafer diameters up to 12″ (300mm) and their corresponding tape frame formats.

Designed to optimize structural cleanroom space, the TAC Series balances a compact physical footprint with industrial-grade reliability. Combining targeted chemical fluid delivery, precision mechanical action, and high-velocity spinning, the series ensures uniform residue removal across variable wafer topologies while maintaining high process safety and minimizing mechanical substrate stress.

Key Features & Advantages

  • High-Efficiency Contaminant Removal: Specifically engineered to eliminate post-dicing debris, fine particles, and surface residues from delicate wafer structures.
  • Optical Sensing Fail-Safe: Equipped with advanced optical safety sensors that automatically halt subsequent actions if the grip frame or cover is misaligned, preventing operator injuries and protecting delicate wafers.
  • Integrated Rotary Cutting: Includes a dedicated rotary knife cutting mechanism to ensure clean, precise tape separation following expansion sequences.
  • Scalable Structural Footprint: Seamlessly handles everything from 4″ to 12″ wafer capacities (across T4 through T12 double ring configurations) within a compact, uniform W500 × L700 × H500 mm frame.
Feature / Item Model: CL6801 Model: CL1201
Compatible Wafer Size 6″ to 8″ 6″ to 12″
Tape Frame Formats 2-6, 2-6-1, 2-8-1 2-6-1, 2-8-1, 2-10-1, 2-12-1
High-Pressure Water System 2 to 12 MPa 2 to 12 MPa
Vacuum Chuck Rotation Speed Up to 3,000 rpm (Max) Up to 3,000 rpm (Max)
Power Supply AC 110V / 220V AC 110V / 220V
Air Consumption Utility 6 kgf/cm² + G 6 kgf/cm² + G
Maximum Air Flow Rate Max. 100 L/min (ANR) Max. 150 L/min (ANR)
Water Supply Pressure 2 to 3 kgf/cm² 2 to 3 kgf/cm²
Maximum Water Flow Rate Max. 10 L/min Max. 15 L/min
Nitrogen (N₂) Pressure 4 to 5 kgf/cm² + G 4 to 5 kgf/cm² + G
Maximum Nitrogen (N₂) Flow Max. 100 L/min (ANR) Max. 150 L/min (ANR)
Exhaust Suction (Minimum) Min. 5.0 m³/min Min. 5.0 m³/min
Physical Dimensions (W x D x H) 850 x 450 x 1200 mm 850 x 550 x 1200 mm
Net Weight 90 kg 120 kg

TUV Series Manual UV Irradiator

The TUV-300 Series Manual UV Irradiator delivers highly uniform, controlled ultraviolet light exposure for semi-automatic and manual semiconductor backend processing lines. Specifically engineered to reduce tape adhesion after wafer dicing or back-grinding, this robust benchtop system effectively alters the chemical profile of UV-curable dicing tapes. By executing localized, uniform curing profiles, it ensures effortless, stress-free die shear and pickup without introducing unwanted thermal load or mechanical stress to fragile wafer topologies.

Designed with flexible structural scaling, the series seamlessly accommodates variable wafer and tape frame sizes ranging from 6″ to 12″. It integrates an intuitive 7-inch Human-Machine Interface (HMI) touch panel that allows operator teams to adjust precision irradiation cycles (ranging from 0.1 seconds up to 999.9 minutes) based on explicit product conditions.

Key Features & Advantages

  • Flexible Light Source Architecture: Available in traditional high-efficiency UV lamp configurations or advanced energy-saving LED systems (TUV-300HL) utilizing 224 high-power 365nm LED pieces.
  • Directional Irradiation Paths: Configurable to suit distinct cleanroom process steps, offering Top-down (TUV-300U), Bottom-up (TUV-300H), or concurrent Dual-sided (TUV-300DP) illumination vectors.
  • Enhanced Curing Environment: Built-in nitrogen (N2) cooling and pathway systems isolate oxygen and lower surface temperatures to drastically enhance UV cross-linking efficiency while protecting temperature-sensitive substrates.
  • Industrial Ergonomics: Features an quick-change tube system for fast lamp maintenance, an integrated magnetic floating exhaust setup, and an automated internal turnover system depending on the chosen fixture package.
System Specification / Feature TUV-300 Standard Line (Lamp Style) TUV-300HL Line (High-Power LED)
Wafer Processing Range 6″, 8″, 12″ (Interchangeable Glass Trays) 6″, 8″, 12″ (Interchangeable Glass Trays)
Illumination Technology High-Pressure Mercury / Halogen Lamp Line 224-Piece High-Power LED Matrix (365nm)
Irradiation Vector Options Top-Down (U Style) / Bottom-Up (H Style) / Dual-Sided (DP Style)
Operator Control System 7-Inch Color HMI Touch Panel Interface 7-Inch Color HMI Touch Panel Interface
Timer Tuning Range 0.1 seconds to 999.9 minutes 0.1 seconds to 999.9 minutes
Electrical Input Requirement Single-Phase AC 220V, 50/60 Hz Single-Phase AC 220V, 50/60 Hz
Pneumatic Air Support 4.0 to 5.0 kgf/cm² 4.0 to 5.0 kgf/cm²
Nitrogen (N₂) Purge Path Optional (For Enhanced Cross-Linking) Integrated Standard (Oxygen Isolation & Cooling)
Structural System Safeguards Anti-UV Observation Panel, Error Alarms, Safety Buzzers, Emergency Stop Switch
Physical Footprint (W x D x H) 530 x 645 x 430 mm 550 x 645 x 430 mm
Net Structural Weight Approx. 45 kg Approx. 50 kg

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